The principal chemical processes and mechanisms that enable Area Selective Deposition (ASD) are rapidly becoming critical in several areas of materials and technological advancement. New ASD processes will be needed to enable “chemical alignment” to complement traditional physical alignment (i.e. lithography) and allow transistors to scale to below 10 nm dimensions. Other fields are also exploring chemical selectivity in materials to achieve precise targeted performance. Catalytic materials, for example, which are commonly employed to promote chemically selective reactions, are now being designed and constructed using site-selective deposition reactions. In addition, the growing complexity of energy generation and storage materials are also driving the need for new site- or area-selective processes to control heterogeneous material structures.
To share advances in these areas, the 5th Area Selective Deposition Workshop (ASD 2021), will be held virtually on April 6 – 8, 2020. The Workshop will bring together leading international scientists and engineers from academia and industry from all regions to share results and insights into: 1) fundamental principles and barriers to area selective deposition; 2) technological needs and challenges as well as new applications of ASD; 3) new chemical approaches and processes to address the expanding needs; and 4) surface characterization techniques and metrology innovation for ASD.
The workshop will begin at 10:00 am (CST) and end at 3:00 pm on April 6 and 7 and at 2:00 pm on April 8. The workshop will include live sessions consisting of invited and contributed talks and panel discussions. A session moderator will ask questions that are entered onto the meeting presentation platform from registrants. Live poster sessions will be held after the oral presentation sessions on April 6 and 7; poster presenters will preload five-minute oral highlights of their poster one week before the workshop.