Register by March 16, 2021 and SAVE $$
Twitter
#ASD2021
ASD_2021_logo_207x46ASD_2021_logo_207x46
logo_avs_sponsored140x55logo_avs_sponsored140x55
  • Overview
    • AVS Code of Conduct
  • Committee
  • Sponsors
  • Schedule
    • Presentation & Poster Guidelines
  • Abstract Submission
    • Abstract Instructions
    • Abstract Template
    • Copyright Agreement
  • Register

Abstract Submission

Abstract Deadline: February 24, 2021

Abstract Submission Guidelines

Please prepare your abstract following the guidelines below.

  • Step 1

    All persons appearing on the program will be required to register for the workshop. Participants are assumed to be attending the entire workshop.

    By submitting an abstract you are agreeing to the following Copyright Agreement.

    VIEW COPYRIGHT AGREEMENT
  • Step 2

    Each abstract should be a single page in length (including figures). The abstract must be submitted as an Adobe PDF file created from the MSWord Template below. The file name should follow this convention: LASTNAME_FirstInitial.PDF

    ABSTRACT TEMPLATE
  • Step 3

    Select a topic to present your abstract from the list below.

  • Step 4

    Please review the instructions below and when ready click the Submit Abstract button in Step 5 to upload your abstract as a PDF file. Questions? E-mail ekerdt@utexas.edu

    VIEW INSTRUCTIONS

Step 5

NOTE: Your submission is not valid until you have successfully completed the entire process and received a printable confirmation page and an e-mail confirmation.

SUBMIT ABSTRACT

Topics

This event is centered on showcasing developments across the whole spectrum of area-selective deposition. Thus, the workshop will cover a wide range of topics including the following:

  • Surface passivation for controlled nucleation and growth
  • Patterned deposition resists, including organic monolayers or polymers
  • Chemical activation for nucleation enhancement
  • Selectivity in thin film etching, including atomic layer etching (ALE)
  • Precursor selection for area-selective deposition
  • Processes and mechanisms for area-selective deposition using ALD, molecular layer deposition (MLD), CVD, PVD, and other thin film deposition techniques
  • Metrology for area-selective deposition
  • Applications for area-selective deposition in electronics manufacturing
  • Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
  • Surface characterization techniques for defects formation and mitigation

Author Notification

Acknowledgment that your abstract has been submitted will follow by e-mail shortly after submission. Notifications regarding acceptance will be sent by e-mail by March 10, 2021.

Platinum Sponsors

Logo Image
Logo Image
Logo Image
Logo Image
VIEW ALL

Follow Us

Tweets by AVS_Members

Key Dates

Abstract Submission Deadline:
February 24, 2021

Author Acceptance Notifications:
March 10, 2021

Early Registration Deadline:
March 16, 2021

Downloads

  • Abstract Instructions
  • Abstract Template
  • Copyright Agreement
  • Presentation & Poster Guidelines

Contact

John G. Ekerdt
University of Texas at Austin
ekerdt@utexas.edu

OverviewCommitteeSponsorsScheduleAbstract SubmissionRegister
© 2021 AVS. All Rights Reserved.